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- Taylor Dynamometer, Inc.
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Towing Dynos for Full-Sized Cars & Light Trucks
Designed to maintain 2,248 to 5,620 lb (10,000 to 25,000 N) of constant drawbar pull, our towing dynamometers for full-sized cars to light trucks are powered by an industrial generator to provide unlimited testing at low speeds. Each model features aluminum frame, independent suspension, aero dynamic body and wireless touchscreen controller.
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Immersion Systems
Immersion systems are the workhorses of the industry. Our latest NXT machines have shown the ability to run in excess of 6,000 wafers per day, with an average five percent productivity increase over 12 months, supporting our customers' value requirements. We continue to innovate our immersion systems to meet the requirements of future nodes, benefiting from commonalities in R&D with our EUV program, while ensuring the platform’s extendibility through System Node Enhancement Package upgrades. Thanks to these packages, any NXT system can be upgraded to the latest technology.
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EUV (Extreme UltraViolet) Chucks
Lightweighted and low-expansion chucks with 10nm active-area flatness are required in EUV lithographic tools. These chucks also have low outgassing and low particle generation.
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EUV Lithography
NXE systems
NXE lithography systems are used in high-volume manufacturing of advanced Logic and Memory chips. The first systems to use ASML’s novel 13.5 nm EUV light source, they print microchip features with a resolution of 13 nm, which is unreachable with deep ultraviolet (DUV) lithography. Chipmakers use our NXE systems to print the highly complex foundation layers of their 7 nm, 5 nm and 3 nm nodes. Read about how EUV lithography went from imagination to reality.
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Dry Systems
Chips are made up of many layers stacked on top of one another, and it’s not necessarily the latest and greatest immersion lithography machines that are used to produce these layers. In a given chip, there may be one or two more complicated layers that are made using an EUV lithography machine, but the rest can often be printed using ‘older’ technology such as dry lithography systems. This is certainly more cost-effective for customers, since these older machines are less expensive to purchase and maintain. Read about how dry lithography systems are enabling progress.
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EUV Lithography Systems
Using extreme ultraviolet (EUV) light, our NXE and EXE systems deliver high-resolution lithography and make mass production of the world’s most advanced microchips possible
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EUV Lithography
EXE systems
EXE, or ‘High NA’, systems are the latest generation in EUV lithography. With a numerical aperture (NA) of 0.55, their innovative new optics provide higher contrast and print with a resolution of just 8 nm.
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Gratings for Synchrotron, FEL and EUV Light Sources
HORIBA Scientific holographic lamellar gratings exhibit ultra-low grooves roughness and unique efficiency uniformity making them ideal for Synchrotron, Free Electron Laser (FEL), EUV or Soft X-ray light sources.
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Patterning Simulation
KLA’s patterning simulation systems use advanced models to explore critical-feature designs, manufacturability and process-limited yield of proposed lithography and patterning technologies. Our patterning simulation software allows researchers to evaluate advanced patterning technologies, such as EUV lithography and multiple patterning techniques, without the time and expense of printing hundreds of test wafers using experimental materials and prototype process equipment.
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X-Ray Cameras for Soft X-Ray, VUV, and EUV Applications
SOPHIA® XO
Teledyne Princeton Instruments
SOPHIA® XO offers high-sensitivity (>95% QE) and high-speed for the widest range of VUV and x-ray detection, with thermoelectric cooling up to -90℃ and high frame rates. With a rotatable, industry-standard CF flange and high-vacuum seal design the software-selectable gains and readout speeds make this camera well suited for UHV applications.
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Semiconductor
Aerotech has a long history of engineering and manufacturing motion systems and components for high precision wafer processing, scanning electron microscopy (SEM), wafer bumping, 450 mm wafer manufacturing, lithography equipment and advanced laser micromachining. We also specialize in systems and components for vacuum applications, such as EUV lithography. So whether you need off-the-shelf wafer bumping components or a custom-engineered SEM system manufactured and tested to exacting specifications, Aerotech can provide the optimal solution for your application.
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Electrodeless Z-Pinch™10 Watt EUV Source
EQ-10
The EQ-10 is a compact, easy-to-use, reliable, and cost-effective EUV light source, based on Energetiq's proven Electrodeless Z-pinch™ technology using Xenon gas. The EQ-10 EUV source is uniquely suited for metrology and research applications.
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wavefront sensors
HASO EUV
Imagine Optic's HASO EUV wavefront sensor, developed in conjunction with LOA and the SOLEIL synchrotron, is the only device of its kind available that offers you the extreme precision and direct measurement functionality needed for today's demanding laboratory and industrial applications.
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Light Source
UVF-210S
By traversing two light guide ends (right and left) by means of the high accuracy air cylinder, alternating irradiation of two independent positions is possible.
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Light Meters
Light Meters are used to measure the light output of an illumination source for a number of optical applications. Light Meters are measurement devices that feature photodiodes to determine the level of light transmitted from a source. Light Meters possess simple, easy to read screens upon which measurements are displayed in one or more photometric units. Most Light Meters possess traceable NIST certification for proof of accuracy.
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Light Meter
DL1076
Switchable between LUX and FC (footcandles)Auto-rangingAuto-zero at turn-onDisplay hold functionAnalog output (2 VDC F.S.)
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Light Sources
There are many low cost artificial light sources used for illumination or for industrial applications: tungsten or halogen bulbs, fluorescent lamps, LED lamps etc. Some of these sources have regulated intensity of emitted light. However, there very few calibrated light sources of precisely known parameters. A light source can be considered as calibrated when its user can precisely regulate its photometric/radiometric parameters like luminance (or illuminance), radiance (or irradiance) at defined spectrum of interest. Such light sources are needed in many applications among them, in systems for testing night vision devices, VIS-NIR cameras and SWIR imagers. Inframet offers a series of calibrated light sources that can be divides into three groups:
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Light Meter
Ideal for measuring mercury, xenon, metal halide or fluorescent lamps, commonly used for studies in the UVA region, as well as sunlight.
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Light Source
LS-BA
Balance Light Source (LS-BA) is designed for transmittance and absorbance measurement with color information. Halogen Light source provides the stable and smooth wide-band spectral output. It’s proper for most visible to near infrared range measurement. The efficiency of blue region will be enhanced by extra two blue LEDs.
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Light Microscopes
Light microscopes from Leica Microsystems meet the highest demands whatever the application – from routine laboratory work to the research of multi-dimensional dynamic processes in living cells.
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Light Transmitter
Measure Range: Range 1: 0-2,000 LuxRange 2: 2,000-20,000 LuxRange 3: 20,000-50,000 LuxOutput: 4-20 mARange 1: 1,000 Lux = 12mA2,000 Lux = 20 mARange 2: 2,000 Lux = 5.6mA20,000 Lux = 20mARange 3: 20,000 Lux = 10.4 mA50,000 Lux = 20 mA90 - 260 ACV50 Hz/60 Hz
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Light Booths
Konica Minolta Sensing Americas, Inc
Konica Minolta’s Light Booth products provide accurate results when inspecting a range of unique products including inks, paints, plastics, textiles, paper and colorants. Light booths simulate lighting conditions which allows testing in a multitude of different lighting conditions. This allows for incredibly precise color measurements in a spectrum of different lights and angles.
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Extreme Temperature Active Probe, 1.5 GHz
N2797A
Testing devices over extreme temperature ranges is quite common these days. The N2797A single-ended active probe is the industry’s first low-cost high input impedance active probe with rugged probe tips for environmental chamber testing of ICs and devices. It gives the ability to probe signals at drastic temperature swings ranging from –40 °C to +85 °C. The probe provides 1.5 GHz of bandwidth and a 2 m long cable.
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Light Sources
Fiber optic light sources are a low-cost way to analyze and identify accurate fiber optic readings, while certifying optical fiber. Receive the ability to measure fiber optic light continuity, loss, and quality of the signal.
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Light Source
pE-300ultra
CoolLED's pE-300ultrais a fluorescence microscopy light source which offers intense, broad-spectrum LED illumination for imaging most common fluorescent stains. Users have access to both microsecond switching via multiple TTL inputs and the ability to mount inline excitation filters. This, when paired with today's high performance multi band filter sets, facilitates imaging traditionally done via a white light source and a filter wheel, with all the benefits of LED.
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Optical Light Sources
FLS300 Series
Shanghai Tarluz Telecom Tech Co., LTD
FLS300 Series Optical light Source transmits with a wavelength-identification digital encrypted protocol, enabling FPM300 Series Optical Power Meter to automatically use the proper calibration wavelength. This feature reduces the need for communication between the two technicians and decreases the possibility of making mistakes.
