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- Taylor Dynamometer, Inc.
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Towing Dynos for Full-Sized Cars & Light Trucks
Designed to maintain 2,248 to 5,620 lb (10,000 to 25,000 N) of constant drawbar pull, our towing dynamometers for full-sized cars to light trucks are powered by an industrial generator to provide unlimited testing at low speeds. Each model features aluminum frame, independent suspension, aero dynamic body and wireless touchscreen controller.
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EUV Lithography
EXE systems
EXE, or ‘High NA’, systems are the latest generation in EUV lithography. With a numerical aperture (NA) of 0.55, their innovative new optics provide higher contrast and print with a resolution of just 8 nm.
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Immersion Systems
Immersion systems are the workhorses of the industry. Our latest NXT machines have shown the ability to run in excess of 6,000 wafers per day, with an average five percent productivity increase over 12 months, supporting our customers' value requirements. We continue to innovate our immersion systems to meet the requirements of future nodes, benefiting from commonalities in R&D with our EUV program, while ensuring the platform’s extendibility through System Node Enhancement Package upgrades. Thanks to these packages, any NXT system can be upgraded to the latest technology.
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Dry Systems
Chips are made up of many layers stacked on top of one another, and it’s not necessarily the latest and greatest immersion lithography machines that are used to produce these layers. In a given chip, there may be one or two more complicated layers that are made using an EUV lithography machine, but the rest can often be printed using ‘older’ technology such as dry lithography systems. This is certainly more cost-effective for customers, since these older machines are less expensive to purchase and maintain. Read about how dry lithography systems are enabling progress.
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EUV (Extreme UltraViolet) Chucks
Lightweighted and low-expansion chucks with 10nm active-area flatness are required in EUV lithographic tools. These chucks also have low outgassing and low particle generation.
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EUV Lithography Systems
Using extreme ultraviolet (EUV) light, our NXE and EXE systems deliver high-resolution lithography and make mass production of the world’s most advanced microchips possible
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Electrodeless Z-Pinch™10 Watt EUV Source
EQ-10
The EQ-10 is a compact, easy-to-use, reliable, and cost-effective EUV light source, based on Energetiq's proven Electrodeless Z-pinch™ technology using Xenon gas. The EQ-10 EUV source is uniquely suited for metrology and research applications.
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X-Ray Cameras for Soft X-Ray, VUV, and EUV Applications
SOPHIA® XO
Teledyne Princeton Instruments
SOPHIA® XO offers high-sensitivity (>95% QE) and high-speed for the widest range of VUV and x-ray detection, with thermoelectric cooling up to -90℃ and high frame rates. With a rotatable, industry-standard CF flange and high-vacuum seal design the software-selectable gains and readout speeds make this camera well suited for UHV applications.
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Gratings for Synchrotron, FEL and EUV Light Sources
HORIBA Scientific holographic lamellar gratings exhibit ultra-low grooves roughness and unique efficiency uniformity making them ideal for Synchrotron, Free Electron Laser (FEL), EUV or Soft X-ray light sources.
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EUV Lithography
NXE systems
NXE lithography systems are used in high-volume manufacturing of advanced Logic and Memory chips. The first systems to use ASML’s novel 13.5 nm EUV light source, they print microchip features with a resolution of 13 nm, which is unreachable with deep ultraviolet (DUV) lithography. Chipmakers use our NXE systems to print the highly complex foundation layers of their 7 nm, 5 nm and 3 nm nodes. Read about how EUV lithography went from imagination to reality.
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Semiconductor
Aerotech has a long history of engineering and manufacturing motion systems and components for high precision wafer processing, scanning electron microscopy (SEM), wafer bumping, 450 mm wafer manufacturing, lithography equipment and advanced laser micromachining. We also specialize in systems and components for vacuum applications, such as EUV lithography. So whether you need off-the-shelf wafer bumping components or a custom-engineered SEM system manufactured and tested to exacting specifications, Aerotech can provide the optimal solution for your application.
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wavefront sensors
HASO EUV
Imagine Optic's HASO EUV wavefront sensor, developed in conjunction with LOA and the SOLEIL synchrotron, is the only device of its kind available that offers you the extreme precision and direct measurement functionality needed for today's demanding laboratory and industrial applications.
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Patterning Simulation
KLA’s patterning simulation systems use advanced models to explore critical-feature designs, manufacturability and process-limited yield of proposed lithography and patterning technologies. Our patterning simulation software allows researchers to evaluate advanced patterning technologies, such as EUV lithography and multiple patterning techniques, without the time and expense of printing hundreds of test wafers using experimental materials and prototype process equipment.
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Ultraviolet Light Distribution Measurement Film
UVSCALE
UVSCALE is a film that responds to UV light, and changes color depending on the amount of light it is exposed. This makes it easy to see UV light distribution. There are a roll type and a sheet type, with three types for different amounts of light.
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Solar Ultraviolet Pyranometers
UVR1-T, UVR1-A, &
The Middleton Solar UVR1 series are precision filter radiometers for measuring solar global ultraviolet irradiance. The UVR1-T and UVR1-A are suitable for air pollution monitoring. The UVR1-B is suitable for biological and human erythema (sunburn) monitoring.
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Light Meters
Light Meters are used to measure the light output of an illumination source for a number of optical applications. Light Meters are measurement devices that feature photodiodes to determine the level of light transmitted from a source. Light Meters possess simple, easy to read screens upon which measurements are displayed in one or more photometric units. Most Light Meters possess traceable NIST certification for proof of accuracy.
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Light Meter
PLMT56
Light Meter Measures In LuxOver-Range IndicatorLong-Life Silicon Photo Diode InsideMeasurement Rate: 1.5 Times per SecondMax Range: 50,000 LuxAccuracy: +/- 5% Under 10000 Lux, +/- 10% Over 10000 LuxMax Resolution: 0.1 LuxDimensions: 7.40' H x 2.52' W x 0.96' DAccessories Included: 12V A23 Battery, Photo DetectorSold as : Unit
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Light Sources
For applications such as transmission, absorption, and reflection, illumination sources are needed. Avantes offers a wide range of different types of light sources, to suit your specific application needs. An overview of the different types of light sources can be found below.
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Light source
UVM-MP
Measurement of maximum of 6 points is possible. By use of thee sensor amplifier box, distance between the light receiving inlet and the controller can be extended to 10 meters. Measurement start signals can be independently output by remote control. This is useful for the light source fixtures integrating shutter mechanism.
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Light Source
UVF-205S
By use of the light guide with the quartz sensor fiber, feed-back control and monitoring of UV irradiation intensity is possible. Also setting of UV intensity and meaurement by personal computer is possible
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Ultraviolet Microscope
UVM-1
The UVM-1™ is a UV microscope that also can image in the visible and NIR. This UV-visible-NIR microscope embodies both advanced optics for cutting edge UV, color and NIR imaging and visualization. The system is a flexible design, very easy to use and very durable. It is designed with cutting edge CRAIC optics for the highest image quality and to give years of service.
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Light Meters
An instrument for measuring the intensity of light, used chiefly to show the correct exposure when taking a photograph.
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Light Sources
Modular sources are available for illumination, excitation and calibration, with options for UV, Visible and NIR wavelengths.
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Light Meters & Sensors
The light meters and sensors product line at Gamma Scientific is extensive. Find sensors, light meters, photometers, radiometers, reference standard detector systems, and transimpedance amplifiers that meet your testing requirements.
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Light Source
A light source essentially is an optical transmitter that is paired with an optical receiver, both of which are connected to electrically based devices or systems. So, the source converts electrons to photons and the detector converts photons to electrons.
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Mode-Conditioned Light Sources
Thorlabs' Mode-Conditioned Light Sources are fiber-coupled LED sources that have an output with a flat-top profile in the far field. Common applications include the testing of multimode fused fiber components as well as verification of modal behavior in fiber-based setups. Standard fiber-coupled LED sources can have a range of output profiles that are usually not uniform and vary from source to source. This can be dependent on emitter orientation, alignment with fiber tip, and connector assembly. These mode-conditioned sources have been engineered to distribute light evenly into all transverse modes, resulting in an equilibrium modal distribution at the output. The front panel includes an adjustment knob to control the power and an output port that accepts 2.2 mm wide-key FC/PC connectors. A DS15 15 V power supply with a location-specific plug is included with each device.
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Forensic Light Source
CrimeScope CS-16-500W
The flagship of the SPEX Forensics Product Line, the CS-16-500W was designed for those departments that prefer the power and IR capabilities of 500W Xenon lamps.
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Extreme Temperature Active Probe, 1.5 GHz
N2797A
Testing devices over extreme temperature ranges is quite common these days. The N2797A single-ended active probe is the industry’s first low-cost high input impedance active probe with rugged probe tips for environmental chamber testing of ICs and devices. It gives the ability to probe signals at drastic temperature swings ranging from –40 °C to +85 °C. The probe provides 1.5 GHz of bandwidth and a 2 m long cable.
